Stochastic simulation of nano-scale surface and near surface region modification: high-temperature blistering and thin films formation
This paper deals with examination such nanotechnology important processes as blistering and thin films formation. These processes change not only substrate properties, but also plasma behaviour. Phenomena are studied by numerical simulation. Kinetic and stochastic models of fluctuating stage of examined processes are created. The models base on kinetic theory, Brownian motion model and stochastic analog method. Fluctuating stage is very short, but it is very important for development blistering as well as thin film formations. The method of second order of accuracy for solution of stochastic differential equations is modified for examined problems. Received physical results coincide with experimental data and can be basis for laboratory experiments.
Publication language:english, страниц:27
Mathematical modelling in actual problems of science and technics